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Peer-reviewed publications

Title Authors Journal
High power pulsed magnetron spultering: A review on scientific and engineering state of the art Sarakinos, K., Alami, J.,
Konstantinidis, S.
(2010) Surface and Coatings Technology, 204 (11), pp. 1661-1684
On the phase formation of titanium oxlde films grown by reactive high power pulsed magnetron sputtering Alami, J. et al. (2009) Journal of Physics D: Applied Physics, 42 ( 11), art. no. 115204
High power pulsed magnetron spulterlng: Fundamentals and applications Alami, J. et al. (2009) Journal of Alloys and Compounds, 483 (1-2), pp. 530-534
On the relationship between the peek terget current 11nd the morphology of chromium nitride thin films deposited by re~dlve high power pulsed magnetron sputtering Alami, J. et al. (2009) Journal of Physics D: Applied Physics, 42 (1), art. no. 015304
Advantages of nanocomposite coetings deposated by high power pulse magnetron sputtering technology Bobzin, Bolz,
S., Alami, J. et al.
(2009) Journal of Materials Process-ing Technology, 209 (1), pp. 165-170
A semi-quantitative model for the depositlon r11te in non-reactive high power pulsed magnetron sputtering Sarakinos, K., Alami, J. et al. (2008) Journal of Physics D: Applied Physics, 41 (21), art. no. 215301
Process stabilization and enhancement of depositoon rate during reactive high power pulsed magnetron sputterlng of zirconium oxide Sarakinos, K., Alami, J. et al. (2008) Surface and Coatings Technology, 202 (20), pp. 5033-5035
The effect of the backscattered energetlc atoms on the stress generation and the surface morphology of reactlvely spultered VMlldium nitride ftlms Sarakinos, K., Alami, J. et al. (2008) Thin Solid Films, 516 (14), pp. 4568-4573
The effect of the microstructure and the surface topogr11phy on the electrical properties ofthin Ag films deposlted by high power pulsed magnetron spultering Sarakinos, K., Wördenweber, J., Uslu, F., Schulz, P., Alami, J., Wultig, M. (2008) Surface and Coatings Technology, 202 (11), pp. 2323-2327
Growth of TiOx ftlms by high power pulsed magnetron sputterin g from a compound Ti01.8 target Sarakinos, K., Alami, J. et al. (2007) Reviews on Advanced Materials Science, 15 (1), pp. 44·48
Process characteristics and film propertles upon growth of TiOx ftlms by high power pulsed magnetron sputterlng Sarakinos, K., Alami, J., Wuttig, M. (2007) Journal of Physics D: Applied Physics, 40 (7), art. no. 037, pp. 2108-2114
Phase tailoring of Tathinfilms by hlghly lonlzed pulsed magnetron sputtering Alami, J. et al. (2007) Thin Solid Films, 515 (7-8), pp. 3434-3438
The role of backscattered energetic 11toms in film growth in readlve magnetron sputtering of chromium nitride Sarakinos, K., Alami et al. (2007) Journal of Physics D: Applied Physics, 40 (3), art. no. 014, pp. 778-785
High-power Impulse magnetron sputtertng of Tl-Si-e thin films from a Ti3SiC2 compound target Alami, J. et al. (2006) Thin Solid Films, 515 (4), pp. 1n1-1n6
The ion energy distributions in a high power Impulse magnetron plasma Helmersson, U., Lattemann, M., Alami, J. et al. (2006) Bulletin of the Russian Academy of Sciences: Physlcs, 70 (8), pp. 1421-1424
On the deposition rate in a high power pulsed magnetron sputtering discharge Alami, J. et al. (2006) Applied Physics Letters, 89 (15), art. no. 154104
Highly ionized sputter discharges for thln film fabrication Bohlmark. J., Ehiasarian, A.P., Lattemann, M., Alami, J., Helmersson, U. (2005) Proceedings, Annual Technical
Conference - Soclety of Vacuum Coaters, pp. 4 70-473
High power Impulse magnetron sputterlng discharges M d thin film growth: A brief review Helmersson, U., Lattemann, M., Alami, J. et al. (2005) Proceedings, Annual Technical
Conference – Society of Vacuum Coaters, pp. 458-464
Ion-acoustic solitary waves in a high power pulsed magnetron sputtering discharge Gylfason, K.B., Alami, J. et al. (2005) Journal of Physics D: Applied Physics, 38 (18), pp. 3417-3421
Plasma dynamics in a highly ionized pulsed magnetron discharge Alami, J. et al. (2005) Plasma Sources Science and Technology, 14 (3), pp. 525-531
Erratum: ”Spatial electron density distribution in 11 high-power pulsed magnetron discharge“ Bohlmark, J., Gudmundsson,
J. T., Alami, J., Latteman, M.,
Helmersson, U.
(2005) lEEE Transadions on Plasma Science, 33 (3), pp. 1129
Spatial electron density distribution in~ high-power pulsed magnetron discharge Bohlmark, J., Gudmundsson, J. T., Alami, J., latteman, M., Helmersson, U. (2005) IEEE Transactions on Plasma Science, 33 (2 I), pp. 346-34 7
Ion-assisted physical vapor deposltlon for enhMced film properlies on nonflat surfaces Alami, J. et al. (2005) Journal of Vecuum Science and Technology A: Vacuum, Surfaces Films, 23 (2), pp. 278-280
Ionization of spultered metals in high power pulsed magnetron spultering Bohlmark, J., Alami, J. et al. (2005) Journal of Vacuum Science and Technology A: Vacuum, Surfaces end Films, 23 (1), pp. 18-22
Measurement of the magnetic field change in a pulsed high current magnetron aischarge Bohlmark, J., Helmersson U., VanZeeland, M., Axnäs, L, Alami, J., Brenning, N. (2004) Plasma Sources Science and Technology, 13 (4), pp. 654-661
Spatlai and temporal behavior of the plesma parameters in a pwlsed magnetron discharge Gudmundsson, J.T., Alami, J., Helmersson, U. (2002) Surface and Coatings Technology, 161(2-3), pp. 249-256
Low temperature deposition of o-AI203 thin films by sputtering using a Cr203 template Jin, P., Xu, G., Tazawa, M., Yoshimura,. K., Music, D., Alami, J., Helmersson, U. (2002) Journal of Vacuum Science and Technology A: Vacuum, Surfaces end Films, 20 (6), pp. 2134-2136
X-ray redprocal space mapping studies of strain relaxation in thin SiGe layers (≤100 nm) using a low temperature growth step Ni, W.-X., Lyutovich, K., Alami, J., Tengstedt, C., Bauer, M., Kasper, E. (2001) Journal of Crystel Growth, 227-228, pp. 756-760
Evolution of the electron energy distrlbution and plasma parameters in a pulsed magnetron discharge Gudmundson, J.T., Alami, J., Helmersson, U. (2001) Applied Physics Letters, 78 (22), pp. 3427-3429